Die Characteristics
DIE DIMENSIONS
Size: 1750µm x 2330µm (69 mils x 92 mils)
Thickness: 483µm (19 mils)
GLASSIVATION
Type: Nitride
Thickness: 4kÅ ± 0.5kÅ
METALLIZATION
Metal 1
Type: AlCu(2%)/TiW
Thickness: 8kÅ ± 0.4kÅ
Metal 2
Type: AlCu(2%)
Thickness: 16kÅ ± 0.8kÅ
HS-1254RH
SUBSTRATE
DI, Bonded Wafer
BACKSIDE FINISH
Silicon
SUBSTRATE POTENTIAL
Floating (Recommend connection to V-)
TRANSISTOR COUNT:
180
Metallization Mask Layout
HS-1254RH
-IN1
OUT1 GND (SEE NOTE 1)
V+
+IN1
NC
DISABLE1
V-
DISABLE2
NC
+IN2
OUT2
-IN2
V-
NOTE:
1. This is an optional GND pad. Users may set a GND reference, via this pad, to ensure the TTL compatibility of the DISABLE inputs when
using asymmetrical supplies (e.g., V+ = 10V, V- = 0V).
2